Fringing field induced current coupling in concentric metal–insulator–semiconductor (MIS) tunnel diodes with ultra-thin oxide
نویسندگان
چکیده
Coupling phenomenon between two Al/SiO2/Si(p) metal–insulator–semiconductor (MIS) tunneling diodes (TD) with various thin oxide thicknesses was studied in detail. When the bias voltage at one MIS TD is positive enough, saturation currents of neighboring TDs concentric gate structures would be approximately same due to current coupling effect though areas these devices are different. With thinner oxide, occurs earlier. This result indicates an enhancement sensitivity oxide. A physical mechanism lateral minority carrier flow attracted by fringing field given explain this phenomenon. Moreover, thickness dependent confirmed capacitance–voltage (C–V) characteristics, and extension strengthening were clarified 2D TCAD simulation.
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ژورنال
عنوان ژورنال: AIP Advances
سال: 2022
ISSN: ['2158-3226']
DOI: https://doi.org/10.1063/5.0081221